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100 nm Au nano-islands coated with 40 nm of polyelectrolyte multilayer; image width 1.2 μm (Weizmann)
100 nm Au nano-islands coated with 40 nm of polyelectrolyte multilayer; image width 1.2 μm (Weizmann)
Test pattern milled in Si using focused ion beam; image width 12.8 μm (Northwestern U)
Asymmetric pattern milled in Si using focused ion beam; image width 5 μm (Northwestern U)
Text milled in Si using focused ion beam; image width 8.5 μm (Northwestern U)
Squares of different exposure times milled in Si using focused ion beam; image width 16 μm (Northwestern U)
18 nm Au nanoparticles, in four layers, dried using critical point drying to prevent aggregation; image width 1.8 μm (Weizmann)
100 nm Au nano-islands, and carbon paste; image width 24 μm (Weizmann)
An electron ratchet device (top-down view), showing the source and drain electrodes (top and bottom), and finger electrode array between them (Northwestern)